Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Degradation by water vapor of hydrogenated amorphous silicon oxynitride  films grown at low temperature

Table 5 from Gas permeation in silicon-oxide / polymer ( SiO x / PET ) barrier films : role of the oxide lattice , nano-defects and macro-defects

(PDF) Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma - ScienceDirect

Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma - ScienceDirect

Table 4 from Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications

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PDF) Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition

Table 5 from Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications

Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma - ScienceDirect

Nanomaterials, Free Full-Text